简历详情

Spin coating in semiconductor lithography: Advances in modeling and future prospects

期刊: Microelectronic Engineering  2025
作者: Pan Liu,Liejie Huang,Chaoyi Zheng,Yanan Bao*,Dawei Gao*,Guodong Zhou*
DOI:10.1016/j.mee.2025.112326

Reliability challenges in CMOS technology: A manufacturing process perspective

期刊: Microelectronic Engineering  2023
作者: Qiao Teng,Yongkang Hu,Ran Cheng,Yongyu Wu,Guodong Zhou*,Dawei Gao*
DOI:10.1016/j.mee.2023.112086