铁电器件课题组（王晓磊）
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Investigation of Thermal Atomic Layer Deposited TaAlC with Low Effective Work-Function on HfO2Dielectric Using TaCl5and TEA as Precursors
2016
期刊
ECS Journal of Solid State Science and Technology
作者
Jinjuan Xiang
· Xiaolei Wang
· Tingting Li
· Jianfeng Gao
· Kai Han
· Jiahan Yu
· Wenwu Wang
· Junfeng Li
· Chao Zhao
- 卷 6
- 期 1
- 页码 P38-P41
- The Electrochemical Society
- ISSN: 2162-8769
- DOI: 10.1149/2.0141701jss
